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ÀÛ¼ºÀÏ : 15-02-02 20:30
2014
 ±Û¾´ÀÌ : Master
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Graphene as an atomically thin barrier to Cu diffusion into Si, J. Hong, S. Lee, S. Lee, H. Han, C. Mahata, H. W. Yeon, B. Koo, S. I. Kim, T. Nam, K. Byun, B. W. Min, Y. W. Kim, H. Kim, Y. C. Joo, and T. Lee,  Nanoscale 6 (13), 7503 (2014).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea
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