ÀÛ¼ºÀÏ : 15-01-21 20:48
2011
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±Û¾´ÀÌ :
Master
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Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl-2/BCl3 Neutral Beam Etching, J. K. Yeon, W. S. Lim, J. B. Park, N. Y. Kwon, S. I. Kim, K. S. Min, I. S. Chung, Y. W. Kim, and G. Y. Yeom, J Electrochem Soc 158 (5), D254 (2011).
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In-situ Electron Microscopy Laboratory 31-411 Dept. of Materials Science and Engineering Seoul National University Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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