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작성일 : 15-01-20 18:20
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2008
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글쓴이 :
Master
 조회 : 1,830
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A two-step-recess process based on atomic-layer etching for high-performance In0.52Al0.48As/In0-53Ga0.47As p-HEMTs, T. W. Kim, D. H. Kim, S. D. Park, S. H. Shin, S. J. Jo, H. J. Song, Y. M. Park, J. O. Bae, Y. W. Kim, G. Y. Yeom, J. H. Jang, and J. I. Song, Ieee T Electron Dev 55 (7), 1577 (2008).
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서울시 관악구 관악로1 서울대학교 31동 411호
실시간관찰전자현미경 연구실
Tel : 02-878-5010 | Fax : 02-878-5010
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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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