ÀÛ¼ºÀÏ : 15-01-20 18:19
2008
|
|
±Û¾´ÀÌ :
Master
Á¶È¸ : 1,812
|
Effect of initial crystallized silicon layer on the properties of microcrystalline silicon grown by internal inductively coupled plasma-type plasma enhanced chemical vapor deposition, H. C. Lee, H. B. Kim, G. Y. Yeom, I. H. Park, and Y. W. Kim, Surf Coat Tech 203 (5-7), 799 (2008).
|
|
|
|
|
|
¼¿ï½Ã °ü¾Ç±¸ °ü¾Ç·Î1 ¼¿ï´ëÇб³ 31µ¿ 411È£ ½Ç½Ã°£°üÂûÀüÀÚÇö¹Ì°æ ¿¬±¸½Ç Tel : 02-878-5010 | Fax : 02-878-5010
COPYRIGHT 2014. ALL RIGHT RESERVED |
In-situ Electron Microscopy Laboratory 31-411 Dept. of Materials Science and Engineering Seoul National University Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
|
|