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작성일 : 15-01-20 18:17
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2007
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글쓴이 :
Master
 조회 : 1,811
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Effective removal of Ga residue from focused ion beam using a plasma cleaner, D. S. Ko, Y. M. Park, S. D. Kim, and Y. W. Kim, Ultramicroscopy 107 (4-5), 368 (2007).
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서울시 관악구 관악로1 서울대학교 31동 411호
실시간관찰전자현미경 연구실
Tel : 02-878-5010 | Fax : 02-878-5010
COPYRIGHT 2014. ALL RIGHT RESERVED |
In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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