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ÀÛ¼ºÀÏ : 15-01-20 18:04
2005
 ±Û¾´ÀÌ : Master
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Formation of nickel silicide layer on strained-Si0.83Ge0.17/Si(001) using a sacrificial Si layer and its morphological instability, C. H. Jang, D. O. Shin, S. I. Baik, Y. W. Kim, Y. J. Song, K. H. Shim, and N. E. Lee,  Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers 44 (7A), 4805 (2005).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea
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