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ÀÛ¼ºÀÏ : 15-01-20 18:19
2008
 ±Û¾´ÀÌ : Master
Á¶È¸ : 1,813  
Effect of initial crystallized silicon layer on the properties of microcrystalline silicon grown by internal inductively coupled plasma-type plasma enhanced chemical vapor deposition, H. C. Lee, H. B. Kim, G. Y. Yeom, I. H. Park, and Y. W. Kim,  Surf Coat Tech 203 (5-7), 799 (2008).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea
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