ÀÛ¼ºÀÏ : 15-01-20 18:19
2008
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±Û¾´ÀÌ :
Master
Á¶È¸ : 1,815
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Effect of initial crystallized silicon layer on the properties of microcrystalline silicon grown by internal inductively coupled plasma-type plasma enhanced chemical vapor deposition, H. C. Lee, H. B. Kim, G. Y. Yeom, I. H. Park, and Y. W. Kim, Surf Coat Tech 203 (5-7), 799 (2008).
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In-situ Electron Microscopy Laboratory 31-411 Dept. of Materials Science and Engineering Seoul National University Gwanak-ro1 Gwanak-gu Seoul, Republic of Korea |
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