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ÀÛ¼ºÀÏ : 15-01-21 20:48
2011
 ±Û¾´ÀÌ : Master
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Removal of Anodic Aluminum Oxide Barrier Layer on Silicon Substrate by using Cl-2/BCl3 Neutral Beam Etching, J. K. Yeon, W. S. Lim, J. B. Park, N. Y. Kwon, S. I. Kim, K. S. Min, I. S. Chung, Y. W. Kim, and G. Y. Yeom,  J Electrochem Soc 158 (5), D254 (2011).

 
   
 

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In-situ Electron Microscopy Laboratory
31-411 Dept. of Materials Science and Engineering
Seoul National University
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